High temperature gas heating device for a vapor deposition system
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United States of America Patent
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Sep 25, 2012
Grant Date -
Mar 17, 2011
app pub date -
Sep 14, 2009
filing date -
Sep 14, 2009
priority date (Note) -
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status (Latency Note)
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Abstract
A gas heating device that may be used in a system for depositing a thin film on a substrate using a vapor deposition process is described. The gas heating device may be configured for heating one or more constituents of a film forming composition. The gas heating device comprises one or more resistive heating elements. Additionally, the gas heating device comprises a mounting structure configured to support at least one of the one or more resistive heating elements. Furthermore, the gas heating device comprises a static mounting device coupled to the mounting structure and configured to fixedly couple the at least one of the one or more resistive heating elements to the mounting structure, and a dynamic mounting device coupled to the mounting structure and configured to automatically compensate for changes in a length of the at least one of the one or more resistive heating elements. Further yet, the dynamic mounting device comprises a thermal break configured to reduce heat transfer between the dynamic mounting device and the mounting structure.
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