Plasma Resistant Processing Apparatus

United States of America Patent

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Issued Date
Apr 14, 2011
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Oct 14, 2010
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Oct 14, 2009

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Abandoned

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Abstract

There is provided a processing apparatus undergoing various treatments using plasma and protected from plasma so as not to be damaged. The processing apparatus is one using plasma and having a protective layer comprising a fluorine-containing elastomer on the whole or a part of a surface exposed to plasma in the processing apparatus.

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GREENE TWEED TECHNOLOGIES INC	1105 NORTH MARKET STREET SUITE 1300 WILMINGTON DE 19801

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Inventor Name	Address	# of filed Patents	Total Citations
Alexander, William Brock	Kulpsville, US	2	8
Hirano, Seiichi	Osaka, JP	44	288
Noguchi, Tsuyoshi	Osaka, JP	86	437
Toshimitsu, Takafumi	Osaka, JP	2	22

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Plasma Resistant Processing Apparatus

Number of patents in Portfolio can not be more than 2000

United States of America Patent

12905026

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12905026

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