Photosensitive resin composition, photosensitive element, method of forming resist pattern, and process for producing printed wiring board

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United States of America Patent

PATENT NO 8586284
APP PUB NO 20110086309A1
SERIAL NO

12933728

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Abstract

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The invention provides a photosensitive resin composition comprising (A) 100 parts by weight of a binder polymer having 10-65 parts by weight of a divalent group obtained from a specific styrene compound and its derivative, 5-55 parts by weight of a divalent group obtained from a specific (meth)acrylic acid ester and its derivative and 15-50 parts by weight of a divalent group obtained from (meth)acrylic acid, (B) a photopolymerizing compound and (C) a photopolymerization initiator.

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Patent Owner(s)

  • HITACHI CHEMICAL COMPANY, LTD.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Miyasaka, Masahiro Hitachi, JP 14 76
Muramatsu, Yukiko Hitachi, JP 7 22
Nankawa, Hanako Hitachi, JP 1 4

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