PROCESS FOR FABRICATING ULTRA-NARROW TRACK WIDTH MAGNETIC SENSOR
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United States of America Patent
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Issued Date -
Apr 21, 2011
app pub date -
Oct 16, 2009
filing date -
Oct 16, 2009
priority date (Note) -
Abandoned
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Abstract
A method for manufacturing a magnetoresistive sensor at very small dimensions with well a controlled track width and clean damage free side wall junctions. The method uses nano-imprinting rather than photolithography to pattern a resist layer. This eliminates the track width variations inherent in photolithographic patterning. The use of nano-imprinting also eliminates the need for a bottom anti-reflective coating beneath the resist layer, thereby also eliminating the need for an additional etch process to remove the bottom anti-reflective coating, which would also cause variations in track width.
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