Source for Inorganic Layer and Method for Controlling Heating Source Thereof
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United States of America Patent
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app pub date -
Feb 28, 2011
filing date -
Aug 31, 2005
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Abandoned
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Abstract
A deposition source for an inorganic layer and a method for controlling a heating source thereof capable of improving a deposition efficiency, preventing condensation of a nozzle, and/or precisely controlling the temperature by minimizing the time that is needed to reach a stabilization of a deposition rate. The deposition source includes: a heating unit including a heating source for applying heat to a crucible; a housing for isolating the heat emitted from the heating unit; an outer wall for anchoring the crucible; and a nozzle unit for spraying the deposition materials evaporated from the crucible. The heating unit includes a first unit and a second unit. The crucible is positioned between the first unit and the second unit, and the heating unit includes a first power source for supplying electric power to the first unit and a second power source for supplying electric power to the second unit.
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