Method And Apparatus To Apply Surface Release Coating For Imprint Mold

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United States of America Patent

SERIAL NO

13027530

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Abstract

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A surface coating apparatus for preparing a work piece having a working surface for imprint lithography, wherein the work piece comprises either a mold or a substrate. The apparatus includes a vacuum chamber and a generator to produce chemical reaction radicals for cleaning the working surface. The generator may be located inside said vacuum chamber and connected to an inner surface of said vacuum chamber or external to the vacuum chamber and connected thereto via suitable couplings. A fixture within the vacuum chamber is configured to hold the work piece with the working surface accessible by the chemical reaction radicals, and a means is provided for depositing a molecular layer of surfactant on the working surface inside the vacuum chamber.

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Patent Owner(s)

Patent OwnerAddress
NANONEX CORPORATION1 DEER PARK DRIVE SUITE O MONMOUTH JUNCTION NJ 08852

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chou, Stephen Y Princeton, US 247 5872
Hu, Lin Livingston, US 65 344
Kong, Linshu Plainsboro, US 5 93
Tan, Hua Princeton Junction, US 100 674
Zhang, Wei Newtown, US 2625 19909

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