Method And Device For Monitoring Measurement Data In Semiconductor Process
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United States of America Patent
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Issued Date -
Jun 30, 2011
app pub date -
Dec 22, 2010
filing date -
Dec 31, 2009
priority date (Note) -
Abandoned
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Abstract
An embodiment of the present invention discloses a method for monitoring measurement data in a semiconductor process, which includes: updating measurement data of wafer performance parameters periodically from a real time system into an analysis database; retrieving from the analysis database the measurement data of a predetermined performance parameter for analysis covered in a time range required in a selected analysis rule according to information on the performance parameter for analysis and information on the selected analysis rule; determining whether the measurement data of the performance parameter retrieved from the analysis database violates a control range of the selected analysis rule, and if so, then transmitting alarm information for the performance parameter violating the control range of the selected analysis rule. The method and device according to the embodiments of the invention can automatically monitor measurement data of wafer performance parameters and discover an abnormal performance parameter.
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