METHOD FOR THE TREATMENT OF SUBSTRATES, SUBSTRATE AND TREATMENT DEVICE FOR CARRYING OUT SAID METHOD
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United States of America Patent
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Mar 14, 2011
filing date -
Sep 15, 2008
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Abstract
In a method for the treatment of substrates (13) for solar cells composed of silicon, after multiple etching the substrates are cleaned (18) with DI water. Afterwards, the substrates (13) are dried and heated in drying stations (22, 25). The heated substrates (13) are subsequently oxidized in an oxidation station (30) by means of oxidation gas (34) with a proportion of ozone.
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