DEVELOPER COMPOSITION
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United States of America Patent
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N/A
Issued Date -
Jul 28, 2011
app pub date -
Mar 10, 2010
filing date -
Jan 28, 2010
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
A developer composition with low metal corrosiveness is provided. The developer composition includes 1 to 10 weight parts of tetraalkylammonium hydroxide; 0.01 to 3 weight parts of a metal corrosion inhibiting agent; 0.1 to 5 weight parts of a pH control agent; 0.1 to 5 weight parts of a surfactant; and water in balance. The developer composition of the present invention has a metal corrosion prevents corrosiveness to metals such as aluminum and copper during a resist development.
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