COMPOSITION FOR FORMING P-TYPE DIFFUSION LAYER, METHOD FOR FORMING P-TYPE DIFFUSION LAYER, AND METHOD FOR PRODUCING PHOTOVOLTAIC CELL

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United States of America Patent

SERIAL NO

13013376

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Abstract

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The composition for forming a p-type diffusion layer in accordance with the present invention contains an acceptor element-containing glass powder and a dispersion medium. A p-type diffusion layer and a photovoltaic cell having a p-type diffusion layer are prepared by applying the composition for forming a p-type diffusion layer, followed by a thermal diffusion treatment.

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Patent Owner(s)

Patent OwnerAddress
HITACHI CHEMICAL COMPANY LTDCHIYODA-KU TOKYO 100-6606

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Adachi, Shuuichirou Tsukuba-shi, JP 16 163
Iwamuro, Mitsunori Tsukuba-shi, JP 35 194
MACHII, YOUICHI Tsukuba-shi, JP 19 170
Nojiri, Takeshi Tsukuba-shi, JP 67 303
Okaniwa, Kaoru Tsukuba-shi, JP 40 200
Yoshida, Masato Tsukuba-shi, JP 214 2996

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