COLLECTOR ASSEMBLY, RADIATION SOURCE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
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United States of America Patent
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Issued Date -
Aug 18, 2011
app pub date -
Sep 3, 2009
filing date -
Oct 17, 2008
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
A collector assembly includes a first collector mirror for reflecting radiation from a radiation emission point, such as an extreme ultraviolet radiation emission point, to an intermediate focus from where the radiation is used in the lithography apparatus for device manufacture. A second collector mirror, forward of the radiation emission point, collects additional radiation, reflecting it back to a third mirror and from there to the intermediate focus. The mirrors may allow radiation to be collected with high efficiency and without increase in the etendue. The collector assembly may reduce or remove non-uniformity in the collected radiation, for instance arising from obscuration of collected radiation by a laser beam stop used to prevent laser excitation radiation from entering the lithographic apparatus.
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