EXTENSION ELECTRODE OF PLASMA BEVEL ETCHING APPARATUS AND METHOD OF MANUFACTURE THEREOF
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United States of America Patent
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Issued Date -
Aug 25, 2011
app pub date -
Feb 11, 2011
filing date -
Feb 22, 2010
priority date (Note) -
Abandoned
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Abstract
An extension electrode with enhanced durability and etching rate for plasma bevel etchers. The extension electrode comprises a plasma exposed truncated conical surface on an annular aluminum body. The aluminum body can roughened prior to anodization and coated with a ceramic material such as yttria.
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