Actinic radiation reactor

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United States of America Patent

PATENT NO 9365435
APP PUB NO 20110210267A1
SERIAL NO

13007949

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A method and system of providing ultrapure water for semiconductor fabrication operations is provided. The water is treated by utilizing a free radical scavenging system and a free radical removal system. The free radical scavenging system can utilize actinic radiation with a free radical precursor compound, such as ammonium persulfate. The free radical removal system can comprise use of a reducing agent. The ultrapure water may be further treated by utilizing ion exchange media and degasification apparatus. A control system can be utilized to regulate addition of the precursor compound, the intensity of the actinic radiation, and addition of the reducing agent to the water.

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Patent Owner(s)

  • EVOQUA WATER TECHNOLOGIES LLC

International Classification(s)

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Coulter, Bruce Lee Rockford, US 14 161

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