Nanostructures with anti-counterefeiting features and methods of fabricating the same
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United States of America Patent
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Issued Date -
Sep 1, 2011
app pub date -
Apr 14, 2011
filing date -
Nov 18, 2008
priority date (Note) -
Abandoned
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Abstract
Embodiments of the invention relate to methods of anti-counterfeiting for nanostructures and nanostructured devices. Specifically we describe a method of embedding a coded micro- or nanopatterns in nanostructures fabricated using Near-field rolling mask lithography, where areas of such features can be embedded into a transparent cylindrical or conic frame, or fabricated on the surface of flexible film laminated on the surface of the frame. Alternatively, specific coded nanofeatures distribution can be created using modulation of intensity or wavelength of the light source along the width or length of such cylinder or cone, or modulation of flexible film thickness or contact pressure between the rotatable mask and a substrate.
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