Focused ion beam apparatus

Number of patents in Portfolio can not be more than 2000

United States of America Patent

APP PUB NO 20110215256A1
SERIAL NO

12931987

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A focused ion beam apparatus includes an ion gun unit having an emitter tip, a gas supply unit including an ion source gas nozzle configured to supply gas to the tip and an ion source gas supply source. An extracting electrode ionizes the gas adsorbed onto the surface of the tip and extracts ions by applying a voltage between the extracting electrode and the tip. A cathode electrode accelerates the ions toward a sample, and a gun alignment electrode positioned on the side of the sample with respect to the ion gun unit and adjusts the direction of irradiation of the ion beam ejected from the ion gun unit. A lens system includes a focusing lens electrode and an objective lens electrode to focus the ion beam onto the sample.

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Patent Owner(s)

Patent OwnerAddress
SII NANOTECHNOLOGY INCCHIBA COUNTY CHIBA JAPAN CHIBA-SHI CHIBA

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Nishinaka, Kenichi Chiba-shi, JP 10 46
Ogawa, Takashi Chiba-shi, JP 332 3124
Sugiyama, Yasuhiko Chiba-shi, JP 50 243

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