Process Chamber, Semiconductor Manufacturing Apparatus and Substrate Processing Method Having the Same
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United States of America Patent
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N/A
Issued Date -
Sep 22, 2011
app pub date -
Mar 16, 2011
filing date -
Mar 18, 2010
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
Disclosed herein is a semiconductor manufacturing apparatus including a transfer chamber provided with a substrate moving device to move substrates, a load lock chamber to align the substrates and to load and unload the substrates into and out of the transfer chamber, and at least one process chamber to process the substrates transferred from the transfer chambers. Each of the at least one process chamber includes a chamber body provided with a substrate entrance formed on a side surface thereof, a substrate support provided within the chamber body such that at least two substrates are disposed on the substrate support, and at least one divider provided within the chamber body to align the at least two substrates.
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