DILUTABLE CMP COMPOSITION CONTAINING A SURFACTANT

United States of America Patent

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Jun 23, 2011
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Feb 27, 2007

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Abstract

The inventive polishing composition comprises an abrasive, an aqueous medium, a surfactant in an amount above its critical micelle concentration, and a hydrophobic surface active compound. The invention also provides a method of using a polishing composition.

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Patent Owner(s)

Patent Owner	Address
CABOT MICROELECTRONICS CORPORATION	AURORA ILLINOIS 60504

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Inventor(s)

Inventor Name	Address	# of filed Patents	Total Citations
De, Rege Thesauro Francesco	Naperville, US	24	210
Keleher, Jason	Aurora, US	12	131

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DILUTABLE CMP COMPOSITION CONTAINING A SURFACTANT

Number of patents in Portfolio can not be more than 2000

United States of America Patent

13167467

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13167467

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