METHOD FOR DECONTAMINATING SEMICONDUCTOR WAFERS

United States of America Patent

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Issued Date
Oct 20, 2011
app pub date
Mar 30, 2011
filing date
Apr 20, 2010

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Abandoned

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Abstract

A method for decontaminating at least one object contained in a chamber, the method including a succession of alternated steps of lowering and increasing the pressure in the chamber.

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Patent Owner(s)

Patent Owner	Address
STMICROELECTRONICS (ROUSSET) SAS	ROUSSET

International Classification(s)

B08B:CLEANING IN GENERAL; PREVENTION OF FOULING IN GENE....

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[Patents Count]

Inventor(s)

Inventor Name	Address	# of filed Patents	Total Citations
Collura, Sëbastien	Istres, FR	1	0
Martin, Christophe	Aix En Provence, FR	20	203

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METHOD FOR DECONTAMINATING SEMICONDUCTOR WAFERS

Number of patents in Portfolio can not be more than 2000

United States of America Patent

13075427

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13075427

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