ETCHING ACID WASTE LIQUID DISPOSAL SYSTEM, ETCHING ACID WASTE LIQUID DISPOSAL APPARATUS AND ETCHING ACID WASTE LIQUID DISPOSAL METHOD APPLIED TO THE SYSTEM AND THE APPARATUS
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United States of America Patent
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Issued Date -
Nov 17, 2011
app pub date -
May 10, 2011
filing date -
May 11, 2010
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
According to one embodiment, a solid removal process in a filter and a positive metal ion removal process in a positive metal ion-exchange resin column are performed sequentially through an etching acid waste liquid disposal circulation flow channel, the solid removal process is performed on an upstream side of the positive metal ion removal process, furthermore after the positive metal ion removal process, a negative metal ion removal process removing at least B using a chelate forming fiber or a chelate forming resin is performed on a downstream side of the etching acid waste liquid disposal circulation flow channel, thereby an etching acid waste liquid is recycled sequentially through the etching acid waste liquid disposal circulation flow channel.
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