Method for chemical vapor deposition control

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United States of America Patent

PATENT NO 9139910
APP PUB NO 20110305831A1
SERIAL NO

12814301

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Abstract

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A method of depositing a thin film on a substrate in a deposition system is described. The method includes disposing a gas heating device comprising a plurality of heating element zones in a deposition system, and independently controlling a temperature of each of the plurality of heating element zones, wherein each of the plurality of heating element zones having one or more resistive heating elements. Additionally, the method includes providing a substrate on a substrate holder in the deposition system, wherein the substrate holder has one or more temperature control zones. The method further includes providing a film forming composition to the gas heating device coupled to the deposition system, pyrolyzing one or more constituents of the film forming composition using the gas heating device, and introducing the film forming composition to the substrate in the deposition system to deposit a thin film on the substrate.

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Patent Owner(s)

Patent OwnerAddressTotal Patents
TOKYO ELECTRON LIMITEDTOKYO5211

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Faguet, Jacques Albany, US 35 295
Lee, Eric M Austin, US 30 238
Strang, Eric J Gilbert, US 67 1029

Cited Art Landscape

Patent Info (Count) # Cites Year
 
Other [Check patent profile for assignment information] (1)
5318809 Apparatus for depositing a material on a substrate by chemical vapor deposition 9 1992
 
LAM RESEARCH CORPORATION (1)
* 2009/0111,276 Temperature control module using gas pressure to control thermal conductance between liquid coolant and component body 17 2008
 
KINIK COMPANY (1)
2008/0047,489 Chemical vapor deposition reactor that pre-heats applied gas and substrate before reaction 5 2006
 
CANON ANELVA CORPORATION (1)
2003/0047,282 Surface processing apparatus 24 2002
 
SAMSUNG ELECTRONICS CO., LTD. (1)
2004/0149,211 Systems including heated shower heads for thin film deposition and related methods 9 2003
 
The University of Toledo (1)
2004/0106,269 NOVEL HOT-FILAMENT CHEMICAL VAPOR DEPOSITION CHAMBER AND PROCESS WITH MULTIPLE GAS INLETS 4 2003
 
AIXTRON AG (1)
2011/0070,370 THERMAL GRADIENT ENHANCED CHEMICAL VAPOUR DEPOSITION (TGE-CVD) 7 2010
 
SI DIAMOND TECHNOLOGY, INC. (1)
6432206 Heating element for use in a hot filament chemical vapor deposition chamber 10 2000
 
MASSACHUSETTS INSTITUTE OF TECHNOLOGY (1)
6887578 Fluorocarbon-organosilicon copolymers and coatings prepared by hot-filament chemical vapor deposition 27 2002
 
SHIN-ETSU CHEMICAL CO., LTD. (1)
6576354 Method for thermal spray coating and rare earth oxide powder used therefor 23 2001
 
PRECISION DIAMOND CO., LTD. (1)
2004/0069,231 Chemical vapor deposition process and apparatus thereof 6 2003
 
UNIVERSITY OF MARYLAND, BALTIMORE (1)
* 6821910 Spatially programmable microelectronics process equipment using segmented gas injection showerhead with exhaust gas recirculation 82 2003
 
ADEKA CORPORATION (1)
5985510 Energy beam curable epoxy resin composition, stereolithographic resin composition and stereolithographic method 26 1997
 
AMERICAN AIR LIQUIDE, INC. (1)
2003/0021,595 Apparatus and method for vaporizing a liquid chemical 12 2002
 
MORGAN CHEMICAL PRODUCTS, INC. (1)
5160544 Hot filament chemical vapor deposition reactor 43 1990
 
APPLIED MATERIALS, INC. (2)
6106630 Ceramic-coated heating assembly for high temperature processing chamber 14 1997
6432259 Plasma reactor cooled ceiling with an array of thermally isolated plasma heated mini-gas distribution plates 52 1999
 
ANELVA CORPORATION (1)
5594280 Method of forming a thin film and apparatus of forming a metal thin film utilizing temperature controlling means 21 1993
 
TOKYO ELECTRON LIMITED (7)
5951772 Vacuum processing apparatus 43 1997
2002/0189,757 Method of wafer band-edge measurement using transmission spectroscopy and a process for controlling the temperature uniformity of a wafer 8 2002
6740853 Multi-zone resistance heater 92 2002
2008/0241,377 VAPOR DEPOSITION SYSTEM AND METHOD OF OPERATING 7 2007
2009/0226,614 POROUS GAS HEATING DEVICE FOR A VAPOR DEPOSITION SYSTEM 7 2008
2009/0223,452 GAS HEATING DEVICE FOR A VAPOR DEPOSITION SYSTEM 6 2008
2011/0061,595 High temperature gas heating device for a vapor deposition system 7 2009
 
MV Systems, Inc. (2)
6214706 Hot wire chemical vapor deposition method and apparatus using graphite hot rods 22 1999
2001/0031,541 Hot wire chemical vapor deposition method and apparatus using graphite hot rods 6 2001
* Cited By Examiner

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