VAPOR DEPOSITION METHOD AND VAPOR DEPOSITION SYSTEM

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United States of America Patent

APP PUB NO 20110311717A1
SERIAL NO

13151435

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Abstract

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Provided is a vapor deposition method of forming one or a plurality of layers on a one surface (7a) side of a glass substrate (7), the one or the plurality of layers including an organic layer (4), the vapor deposition method including: forming at least one layer of the one or the plurality of layers by vapor deposition treatment; and in the vapor deposition treatment, bringing one surface (15a) of a cooling plate (15) for cooling the glass substrate (7) into direct surface contact with another surface (7b) of the glass substrate (7), and bringing the contact surfaces (7b and 15a) of the cooling plate and the glass substrate into an intimate contact with each other to an extent of being peelable by the direct surface contact.

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Patent Owner(s)

Patent OwnerAddress
NIPPON ELECTRIC GLASS CO LTD7-1 SEIRAN 2-CHOME OTSU-SHI SHIGA 5208639 ?5208639

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Takaya, Tatsuya Otsu-shi, JP 29 436
Takimoto, Hiroshi Otsu-shi, JP 46 788
YAMAZAKI, Yasuo Otsu-shi, JP 72 853

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