Sputtering target, oxide semiconductor film and semiconductor device

United States of America Patent

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Dec 18, 2012
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Dec 29, 2011
app pub date
Feb 28, 2008
filing date
Mar 20, 2007

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Abstract

A sputtering target including an oxide sintered body, the oxide sintered body containing indium (In) and at least one element selected from gadolinium (Gd), dysprosium (Dy), holmium (Ho), erbium (Er) and ytterbium (Yb), and the oxide sintered body substantially being of a bixbyite structure.

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IDEMITSU KOSAN CO., LTD.

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Inventor Name	Address	# of filed Patents	Total Citations
Inoue, Kazuyoshi	Sodegaura, JP	118	4436
Kasami, Masashi	Sodegaura, JP	23	1296
Yano, Koki	Sodegaura, JP	85	4057

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Sputtering target, oxide semiconductor film and semiconductor device

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United States of America Patent

12532247

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PATENT NO	8333913
APP PUB NO	20110315936A1
SERIAL NO	12532247
DOCKET NO

US Family Size	Non-US Coverage
Patent Longevity Expired	Forward Citations

DATE PUBLISHED	PUBLICATION/PATENT NO.	PUBLICATION TYPE
December 18, 2012	US,8333913,B2 US8333913B2	GRANTED PATENT AS SECOND PUBLICATION
December 29, 2011	US,20110315936,A1 US20110315936A1	FIRST PUBLISHED PATENT APPLICATION

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12532247

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