FILM STRUCTURE AND METHOD FOR MANUFACTURING THE SAME
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United States of America Patent
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Issued Date -
Mar 1, 2012
app pub date -
Dec 7, 2010
filing date -
Aug 26, 2010
priority date (Note) -
Abandoned
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Abstract
A film structure is described. The film structure includes a substrate and a metal film. The film structure is formed on the substrate by a physical vapor deposition method. A bottom diameter of particles forming the metal film is substantially between 0.05 μm and 2 μm, and a height of the particles of the metal film is substantially between 0.05 μm and 3 μm. The metal film has a brightness, a first chroma and a second chroma in a visible light region, which includes a wavelength range between 380 nm and 770 nm, the brightness is substantially between 65 and 95, the first chroma is substantially between −2.1 and 2.1, and the second chroma is substantially between −2.1 and 2.1
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