MONODISPERSE CHLOROMETHYLSTYRENE POLYMER AND PRODUCING METHOD THEREOF

United States of America Patent

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Issued Date
Mar 8, 2012
app pub date
May 10, 2010
filing date
May 11, 2009

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Abandoned

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Abstract

Provided is a monodisperse polymer of chloromethylstyrene as a bifunctional compound. Chloromethylstyrene is purified to a purity of at least 99% and polymerized preferably using a RAFT reagent.

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Patent Owner(s)

Patent Owner	Address
AGC SEIMI CHEMICAL CO LTD	CHIGASAKI-SHI KANAGAWA 253-8585

International Classification(s)

C08F:MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONL....

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Inventor Name	Address	# of filed Patents	Total Citations
Endo, Takeshi	Fukuoka, JP	213	2590
Kambara, Riina	Yamagata, JP	1	0
Mori, Hideharu	Yamagata, JP	17	91
Yonemori, Shigeaki	Kanagawa, JP	7	29

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MONODISPERSE CHLOROMETHYLSTYRENE POLYMER AND PRODUCING METHOD THEREOF

Number of patents in Portfolio can not be more than 2000

United States of America Patent

13319962

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