Object Inspection Systems and Methods
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United States of America Patent
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Issued Date -
Apr 5, 2012
app pub date -
Apr 13, 2010
filing date -
Jun 22, 2009
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
Disclosed are systems and methods for object inspection, in particular for inspection of reticles used in a lithography process. The method includes interferometrically combining a reference radiation beam with a probe radiation beam, and storing their complex field images. The complex field image of one object is then compared with that of a reference object to determine the differences. The systems and methods have particular utility in the inspection of a reticle for defects.
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