Chemical mechanical polishing apparatus having pad conditioning disk and pre-conditioner unit

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United States of America Patent

PATENT NO 8597081
APP PUB NO 20120083189A1
SERIAL NO

13241421

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Abstract

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A pad conditioning disk, a pre-conditioning unit, and a CMP apparatus having the same are provided. The pad conditioning disk includes a base in which mountain-type tips and valley-type grooves are repeatedly connected to each other, and a cutting layer formed on the base layer. The cutting layer including conditioning particles deposited on surfaces of the tips and grooves. A surfaces roughness of conditioning particles deposited on the surfaces of the tips is less than a surface roughness of conditioning particles deposited on the surfaces of the grooves.

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Patent Owner(s)

  • SAMSUNG ELECTRONICS CO., LTD.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Choi, Jae-Kwang Suwon-si, KR 14 224
Han, Sol Gyeonggi-do, KR 33 78
Kim, Hong-Jin Seoul, KR 18 26
Kwon, Byoung-Ho Hwaseong-si, KR 23 268
Lee, Kun-Tack Suwon-si, KR 62 930
Seo, Keon-Sik Suwon-si, KR 3 11

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