Method and apparatus for reducing particle defects in plasma etch chambers

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 10658161
APP PUB NO 20120091095A1
SERIAL NO

13174090

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Abstract

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In-situ low pressure chamber cleans and gas nozzle apparatus for plasma processing systems employing in-situ deposited chamber coatings. Certain chamber clean embodiments for conductor etch applications include an NF3-based plasma clean performed at pressures below 30 mT to remove in-situ deposited SiOx coatings from interior surfaces of a gas nozzle hole. Embodiments include a gas nozzle with bottom holes dimensioned sufficiently small to reduce or prevent the in-situ deposited chamber coatings from building up a SiOx deposits on interior surfaces of a nozzle hole.

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Patent Owner(s)

  • APPLIED MATERIALS INC.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
He, Xiaoming Arcadia, US 45 2000
Lee, Changhun San Jose, US 55 1294
Nguyen, Andrew San Jose, US 277 16774
Shen, Meihua Fremont, US 69 2336
Wang, Xikun Sunnyvale, US 60 7633

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