RF IMPEDANCE MATCHING NETWORK WITH SECONDARY DC INPUT
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United States of America Patent
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Issued Date -
Apr 26, 2012
app pub date -
Oct 20, 2010
filing date -
Oct 20, 2010
priority date (Note) -
Abandoned
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Abstract
Embodiments of the disclosure may provide a matching network for a physical vapor deposition system. The matching network may include an RF generator coupled to a first input of an impedance matching network, and a DC generator coupled a second input of the impedance matching network. The impedance matching network may be configured to receive an RF signal from the RF generator and a DC signal from the DC generator and cooperatively communicate both signals to a deposition chamber target through an output of the impedance matching network. The matching network may also include a filter disposed between the second input and the output of the impedance matching network.
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