WET ETCHING APPARATUS AND METHOD

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United States of America Patent

APP PUB NO 20120111835A1
SERIAL NO

13386379

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A wet etching apparatus includes: an etching vessel applying etchant to a substrate to etch the substrate; and a water cleaning vessel and a drying vessel connected to the etching vessel, successively processing the substrate, and provided with an air knife removing droplets on the substrate. The wet etching apparatus further includes: a duct connected at least to the etching vessel and having an interior maintained at a negative pressure; and an exhaust pipe connecting the water cleaning vessel and the drying vessel to the duct. The exhaust pipe is provided with an auto damper opening/closing the exhaust pipe and an inlet introducing external air. This allows the air knife to operate while allowing the wet etching apparatus to hold internal pressure lower than external pressure.

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Patent Owner(s)

Patent OwnerAddress
SHARP KABUSHIKI KAISHA1 TAKUMI-CHO SAKAI-KU SAKAI CITY OSAKA 590-8522

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Ogata, Shohichi Osaka, JP 1 2
Suganaga, Daisuke Hyogo, JP 1 2

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