STAIN-RESISTANT CONTAINER AND METHOD
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United States of America Patent
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Issued Date -
May 24, 2012
app pub date -
Nov 19, 2010
filing date -
Nov 19, 2010
priority date (Note) -
Abandoned
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Abstract
Stain resistant containers can be prepared in a three step process involving treatment with a nitrogen gas plasma, depositing a plasma enhanced chemical vapor deposition (PECVD) organosilicon thin film onto the interior surface of the container, followed by treatment with an oxygen gas plasma. An apparatus for the process is described, including an automated apparatus for treating multiple containers and multiple chambers of containers.
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