UNEVEN AREA INSPECTION SYSTEM
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United States of America Patent
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N/A
Issued Date -
May 31, 2012
app pub date -
Nov 30, 2010
filing date -
Nov 30, 2010
priority date (Note) -
Abandoned
status (Latency Note)
Importance
Abstract
An uneven area inspection system of the present invention comprises a patterned panel comprising a panel, wherein the panel have a surface on which a pattern is formed, an object with at least one surface reflecting light from the patterned panel, an imaging unit optically coupled to the patterned panel and the object and configured to capture the image of the patterned panel reflected by the surface of the object, and an image processing unit configured to process the captured image to compare the pattern in the patterned panel and the pattern in the captured image. The object can have uneven area and the uneven area of the object is inspected by comparing the pattern in the patterned panel and the pattern in the captured image.
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