CONFINED RESISTANCE VARIABLE MEMORY CELL STRUCTURES AND METHODS

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United States of America Patent

SERIAL NO

13403443

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Abstract

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Confined resistance variable memory cell structures and methods are described herein. One or more methods of forming a confined resistance variable memory cell structure includes forming a via in a memory cell structure and forming a resistance variable material in the via by performing a process that includes providing a germanium amidinate precursor and a first reactant to a process chamber having the memory cell structure therein and providing an antimony ethoxide precursor and a second reactant to the process chamber subsequent to removing excess germanium.

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Patent Owner(s)

Patent OwnerAddress
MICRON TECHNOLOGY INC8000 SOUTH FEDERAL WAY BOISE ID 83716-9632

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kraus, Brenda D Boise, US 61 1020
Marsh, Eugene P Boise, US 225 5794
Quick, Timothy A Boise, US 70 1799

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