US Patent Application No: 2012/0154,779

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SPECTRAL PURITY FILTER, LITHOGRAPHIC APPARATUS, AND METHOD FOR MANUFACTURING A SPECTRAL PURITY FILTER

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Abstract

A method for manufacturing a spectral purity filter is provided in which openings in a first surface of a base material, corresponding to a plurality of apertures of the spectral purity filter, are formed. At least the surfaces of the base material surrounding the openings in the first surface are chemically treated to form a layer of a second material, and the base material is etched from the second surface such that the openings extend from the first surface of the base material to the second surface of the base material.

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Patent Owner(s)

Patent OwnerAddressTotal Patents
ASML NETHERLANDS B.V.VELDHOVEN1949

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Jak, Martin Jacobus Johan Eindhoven, NL 44 36
Soer, Wouter Anthon Nijmegen, NL 72 26

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