METHOD AND DEVICE FOR CHEMICAL VAPOR DEPOSITION OF POLYMER FILM ONTO A SUBSTRATE
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United States of America Patent
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Issued Date -
Jul 12, 2012
app pub date -
Sep 6, 2010
filing date -
Sep 17, 2009
priority date (Note) -
Abandoned
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Abstract
A method for chemical vapor deposition of a polymer film onto a substrate (6), includes the following two separate, consecutive steps:—a step for the photon activation of the gas phase wherein photon activation energy (42, 43) is provided to at least one gaseous polymer precursor that is present in a mainly gaseous composition, and—a chemical vapor deposition step wherein the activated gaseous polymer precursor, from the photon activation step, is deposited onto a substrate (6) so as to form a polymer film on the substrate, the total gas phase pressure ranging from 102 to 105 Pa. A device (1) for using such a method is also described.
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