Photochemical methods and photoactive compounds for modifying surfaces
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United States of America Patent
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Feb 17, 2015
Grant Date -
Jul 12, 2012
app pub date -
Mar 9, 2012
filing date -
Nov 9, 2005
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Abstract
Compounds and methods for controlling the surface properties are described. Compounds of the invention can form radicals upon exposure to irradiation, which can then react with nearby molecules to alter the surface properties of various substrates. The invention can provide surfaces that are resistant to dewetting, surfaces that have immobilized molecules such as carbohydrates and polymers immobilized, and surfaces that have metals deposited on the surface. The invention can be utilized in a wide range of application, such as sensors, microreactors, microarrays, electroless deposition of metals, and the like.
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