METHOD FOR PRODUCING PERFLUOROSULFONIC ACID HAVING ETHER STRUCTURE AND DERIVATIVE THEREOF, AND SURFACTANT CONTAINING FLUORINE-CONTAINING ETHER SULFONIC ACID COMPOUND AND DERIVATIVE THEREOF

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United States of America Patent

APP PUB NO 20120184763A1
SERIAL NO

13498710

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In this method, RH2ORH1SO2F is added to hydrofluoric acid so as to form a thick solution (hydrogen bonded complex), and the solution is directly supplied to a liquid phase reaction system in which an F2 gas is used. Alternatively, RH2ORH1SO2Cl is added to hydrofluoric acid so as to be converted into RH1ORH2SO2F by discharging HCl, and the RH1ORH2SO2F is directly supplied to a liquid phase reaction system in which an F2 gas is used. Consequently, fluorination can be carried out safely and a compound having an objective structure can be produced at low cost without causing isomerization or the like.

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Patent Owner(s)

Patent OwnerAddress
MITSUBISHI MATERIALS CORPORATION2-3 MARUNOUCHI 3-CHOME CHIYODA-KU TOKYO 100-8117
MITSUBISHI MATERIALS ELECTRONIC CHEMICALS CO LTDAKITA-SHI AKITA 010-8585

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Honda, Tsunetoshi Akita-shi, JP 31 309
Kurumaya, Mitsuo Katagami-shi, JP 5 22
Omori, Kota Akita-shi, JP 6 7

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