US Patent Application No: 2012/0186,354

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CAPACITANCE TYPE PRESSURE SENSOR AND METHOD FOR MANUFACTURING A CAPACITANCE TYPE PRESSURE SENSOR

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Abstract

A capacitance type pressure sensor includes a semiconductor substrate having a reference pressure compartment formed therein, a diaphragm formed of a portion of the semiconductor substrate and formed in a surface layer portion of the semiconductor substrate to define the reference pressure compartment, the diaphragm having a through-hole communicating with the reference pressure compartment, fillers arranged within the through-hole, and an isolation insulating layer surrounding the diaphragm to isolate the diaphragm from the remaining portion of the semiconductor substrate.

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First Claim

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Patent Owner(s)

Patent OwnerAddressTotal Patents
ROHM CO., LTD.KYOTO2958

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
OKADA, Mizuho - 17 14

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