US Patent Application No: 2012/0187,083

Number of patents in Portfolio can not be more than 2000

SUBSTRATE TREATMENT METHOD AND SUBSTRATE TREATMENT APPARATUS

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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An inventive substrate treatment method includes a silylation step of supplying a silylation agent to a substrate, and an etching step of supplying an etching agent to the substrate after the silylation step. The method may further include a repeating step of repeating a sequence cycle including the silylation step and the etching step a plurality of times. The cycle may further include a rinsing step of supplying a rinse liquid to the substrate after the etching step. The cycle may further include a UV irradiation step of irradiating the substrate with ultraviolet radiation after the etching step. The method may further include a pre-silylation or post-silylation UV irradiation step of irradiating the substrate with the ultraviolet radiation before or after the silylation step.

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Patent Owner(s)

Patent OwnerAddressTotal Patents
DAINIPPON SCREEN MFG. CO., LTD.KYOTO1479

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hashizume, Akio Kyoto, JP 27 23

Patent Citation Ranking

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Patent Info (Count) # Cites Year
 
TOKYO ELECTRON LIMITED (1)
8,597,401 Exhausting method and gas processing apparatus 0 2011