Microchannel plate and its manufacturing method

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 8729447
APP PUB NO 20120187278A1
SERIAL NO

13383001

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Abstract

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A microchannel plate (1) having an array of channels (5),includes a substrate (2) and, deposited on the substrate, a hydrogenated amorphous silicon film (3) having a thickness ranging between 50 μm and 200 μm, preferably between 80 μm and 120 μm, the film including the array of channels (5). Preferably, the substrate (2) is an integrated circuit having an internal electronic readout circuit and pixilated collection electrodes (8), and the film (3) is integrated on the substrate (2). The channels (5) may be formed by a Deep Reactive Ion Etching (DRIE) process.

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Patent Owner(s)

Patent OwnerAddressTotal Patents
ECOLE POLYTECHNIQUE FEDERALE DE LAUSANNE (EPFL)LAUSANNE269

International Classification(s)

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Jarron, Pierre Saint-Julien, FR 3 33
Wyrsch, Nicolas Hauterive, CH 1 0

Cited Art Landscape

Patent Info (Count) # Cites Year
 
NANOSYSTEMS, INC. (1)
* 5997713 Silicon etching process for making microchannel plates 78 1998
 
NETOPTIX CORPORATION (1)
5568013 Micro-fabricated electron multipliers 33 1994
 
LITTON SYSTEMS, INC. (1)
5359187 Microchannel plate with coated output electrode to reduce spurious discharges 6 1993
 
EMISSION SYSTEMS, INC. (1)
6522061 Field emission device with microchannel gain element 16 2000
* Cited By Examiner

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