Process Gas Conduits Having Increased Usage Lifetime and Related Methods
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United States of America Patent
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Issued Date -
Aug 2, 2012
app pub date -
Aug 4, 2011
filing date -
Aug 6, 2010
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
The invention described here relates to a gas injector for use in a semiconductor etching process or other processes involving aggressive gases or gas plasmas, and more particularly to a gas injector and gas conduits having extended usage life, and exhibiting less etching and particle generation with usage.
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