DEVELOPING METHOD AND APPARATUS USING ORGANIC-SOLVENT CONTAINING DEVELOPER
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United States of America Patent
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Issued Date -
Aug 30, 2012
app pub date -
Feb 15, 2012
filing date -
Feb 24, 2011
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
Provided are a developing method and a developing apparatus that can reduce process time and improve throughput in a developing process using a developer containing organic solvent. The present invention relates to a developing method for performing developing by supplying a developer containing organic solvent to a substrate having its surface coated with a resist and exposed. The developing method of the invention includes a liquid film forming step for forming a liquid film by supplying the developer from a developer supply nozzle to a central portion of the substrate while rotating the substrate, and a developing step for developing the resist film on the substrate while rotating the substrate in a state where the supply of the developer from the developer supply nozzle to the substrate is stopped and in such a manner that the liquid film of the developer would not dry.
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