CARBON MATERIAL AND METHOD OF MANUFACTURING THE SAME
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United States of America Patent
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Sep 20, 2012
app pub date -
Sep 22, 2010
filing date -
Nov 25, 2009
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Abstract
When treated with a halogen gas, a carbon material can inhibit emission of an impurity after the treatment. A method of manufacturing the carbon material is also provided. A carbon material is subjected to an annealing process under a reduced pressure of from 1 to 10000 Pa in a H2 gas atmosphere at 500° C. to 1200° C. The duration of the annealing process is from 1 minute to 20 hours. This makes it possible to control the concentration of the halogen emitted, such as chlorine, to 5 ppb or less.
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