On-chip diffraction grating prepared by crystallographic wet-etch
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United States of America Patent
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Mar 3, 2015
Grant Date -
Oct 4, 2012
app pub date -
Mar 30, 2011
filing date -
Mar 30, 2011
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Abstract
Methods of forming microelectronic structures are described. Embodiments of those methods may include forming a photomask on a (110) silicon wafer substrate, wherein the photomask comprises a periodic array of parallelogram openings, and then performing a timed wet etch on the (110) silicon wafer substrate to form a diffraction grating structure that is etched into the (110) silicon wafer substrate.
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