Integrated Substrate Cleaning System and Method
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United States of America Patent
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Issued Date -
Nov 8, 2012
app pub date -
Oct 28, 2011
filing date -
Oct 28, 2010
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
A method for cleaning a substrate having organic and inorganic residues disposed thereon is provided. The method includes removing organic residue from the substrate using atmospheric oxygen plasma, and removing inorganic residue from the substrate using cryogenic CO2. The substrate may be pretreated using a benign cooling agent, and post-treated using a dilute wet chemical cleaning method.
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