RESIST REMOVAL APPARATUS AND RESIST REMOVAL METHOD
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United States of America Patent
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app pub date -
Aug 24, 2012
filing date -
Mar 18, 2010
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Abandoned
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Abstract
A resist removal apparatus and method are effective in removing a resist without oxidizing the substrate material other than the resist. The resist removal apparatus, which removes resist from a wafer on which a resist film has been formed, includes a cluster spraying unit which sprays a wafer with clusters each of which is formed of a plurality of organic solvent molecules agglomerated together.
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