Method for generating charged particles
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United States of America Patent
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N/A
Issued Date -
Dec 13, 2012
app pub date -
Aug 21, 2012
filing date -
Oct 18, 2004
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
A method for establishing a calibrating standard for wafer inspection includes depositing solid ionized particles of a known size range with an aerosol onto a wafer. The method also includes depositing particles onto a wafer in a deposition chamber by using an aerosol stream and the solid particles suspended in a gas; ionizing the aerosol stream with a negative or positive charge polarity or both by passing the aerosol stream through a non-radioactive ionizer to produce charged particles and supplying such aerosol stream to the deposition chamber.
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