Full-field maskless lithography projection optics

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United States of America Patent

PATENT NO 9411246
APP PUB NO 20130003166A1
SERIAL NO

13538287

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Abstract

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Projection optics for a lithographic projection system is provided that comprises a spatial light modulator (SLM) from which radiation is reflected and directed to a projection lens that projects the radiation to a substrate. The SLM is illuminated by non telecentric off axis illumination (e.g. from laser radiation that has a spectral bandwidth of the order of 1 picometer, and the projection optics is configured for significant reduction (e.g. at least 10× reduction, 20× reduction, or 50× reduction).

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Patent Owner(s)

Patent OwnerAddress
NIKON CORPORATION15-3 KONAN 2-CHOME MINATO-KU TOKYO 1086290

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Williamson, David Michael Tucson, US 11 72

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