PRESSURE TRANSMITTER FOR A SEMICONDUCTOR PROCESSING ENVIRONMENT
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United States of America Patent
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Jan 24, 2013
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Jul 20, 2011
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Jul 20, 2011
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Abstract
Embodiments related to measuring process pressure in low-pressure semiconductor processing environments are provided. In one example, a semiconductor processing module for processing a substrate with a process gas in a vacuum chamber is provided. The example module includes a reactor positioned within the vacuum chamber for processing the substrate with the process gas and a pressure-sensitive structure operative to transmit a pressure transmission fluid pressure to a location exterior to the vacuum chamber. In this example, the pressure transmission fluid pressure varies in response to the process gas pressure within the vacuum chamber.
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