APPARATUS AND METHOD FOR TREATING SUBSTRATE
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United States of America Patent
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Issued Date -
Jan 31, 2013
app pub date -
Jul 27, 2012
filing date -
Jul 29, 2011
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
Provided are an apparatus and method for treating a substrate. More particularly, an apparatus and method for treating a substrate through a supercritical process are provided. The apparatus includes a housing having an entrance in a side thereof and providing a space for performing a process, a door for opening and closing the entrance, and a support member disposed on the door to receive a substrate thereon.
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