MANUFACTURING METHOD FOR POLYCRYSTALLINE SILICON INGOT, AND POLYCRYSTALLINE SILICON INGOT

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United States of America Patent

APP PUB NO 20130028825A1
SERIAL NO

13636490

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Abstract

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A method for manufacturing a polycrystalline silicon ingot includes: solidifying a silicon melt retained in a crucible unidirectionally upward from a bottom surface of the silicon melt, wherein a silicon nitride coating layer is formed on inner surfaces of side walls and an inner side surface of a bottom of the crucible, a solidification process in the crucible is divided into a first region from 0 mm to X (10 mm≦X<30 mm) in hight, a second region from X to Y (30 mm≦Y<100 mm), and a third region of the Y or higher, with the bottom of the crucible as a datum, a solidification rate V1 in the first region is in a range of 10 mm/h≦V1≦20 mm/h, and a solidification rate V2 in the second region is in a range of 1 mm/h≦V2≦5 mm/h.

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Patent Owner(s)

Patent OwnerAddress
MITSUBISHI MATERIALS CORPORATION2-3 MARUNOUCHI 3-CHOME CHIYODA-KU TOKYO 100-8117
MITSUBISHI MATERIALS ELECTRONIC CHEMICALS CO LTDAKITA-SHI AKITA 010-8585

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Ikeda, Hiroshi Tokyo, JO 368 9682
Kanai, Masahiro Akita-shi, JP 212 9340
Tsuzukihashi, Koji Akita-shi, JP 4 24
Wakita, Saburo Noda-shi, JP 24 610

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